Huttinger TIG10/100P RF Generator

Huttinger TIG10/100P RF power generator for semiconductor vacuum plasma coating and etching equipment.
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Products Description


Huttinger TIG10/100P RF Generator



Technical Specifications

Model:TIG10/100P Brand:Huttinger Product Type: RF power generator

Module Feature

Huttinger TIG10/100P is compact RF power source of Huttinger TIG series, designed for semiconductor plasma process applications. It delivers stable RF output power and works with matching network for thin film deposition and etching processes. It has compact rack mount design, built-in multiple safety protection and local/remote control function. Widely applied in semiconductor PVD, CVD and plasma etching vacuum equipment. Working principle: RF power generation Application frequency:13.56MHz Onboard components: RF amplifier unit, control board, protection circuit, power and signal connectors

LED indicators

Equipped with front panel status LED indicators

Hardware self-diagnosis

RF output power test, insulation resistance test, reflected power inspection, alarm function test

Programming software

Huttinger service software for parameter configuration and fault diagnosis reading

Electrical Parameters

Input voltage: 230V AC Application: Semiconductor vacuum plasma process

Mechanical & Structure

Mounting: Rack mount installation Protection class: IP20

Environmental

Operating temperature:10℃ ~ +45℃ Ambient humidity:5~85% non-condensing Certification: CE Status: Huttinger TIG series RF generator

System compatibility

TIG10/100P is compatible with Huttinger matching network and related spare components for semiconductor vacuum plasma processing equipment.

Function

TIG10/100P is RF power generator manufactured by Huttinger. It generates stable 13.56MHz RF power to excite vacuum plasma for semiconductor thin film coating and etching. It supports automatic impedance matching to reduce reflected power. Built-in overvoltage, overcurrent, overheat and high reflected power protection. It supports local panel operation and remote communication control. It is the core power source of plasma processing equipment.

Installation

Follow lockout/tagout safety procedure before installation. Cut off all power and discharge high voltage components. Install the RF generator into equipment rack. Connect AC power cable, RF coaxial cable and control signal cable. Check wiring terminals and insulation clearance. Restore power, run RF output test and alarm inspection.

Interface

50Ω RF coaxial output port, AC power terminals, signal communication ports, fixed mounting holes on TIG10/100P.

Diagnostic

No RF output: Power supply fault, interlock trigger or damaged coaxial cable. High reflected power: Impedance mismatch or defective matching network. Overheat alarm: Poor cooling fan or internal component failure.



Product Brief

TIG10/100P Huttinger TIG series RF generator,used for semiconductor vacuum plasma coating and etching process,RF plasma power source.


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