MKS Instruments AX7685-33 RPS Remote Plasma Source

MKS AX7685-33 RPS remote plasma source,high purity remote plasma generator for semiconductor chamber clean and surface treatment process.
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Products Description


MKS Instruments AX7685-33 RPS Remote Plasma Source



Module Feature

MKS AX7685-33 RPS belongs to AX series remote plasma source. It generates high-density neutral radical plasma outside the vacuum chamber, avoiding direct plasma bombardment on wafer. Corrosion-resistant quartz chamber, stable plasma ignition, excellent radical conversion efficiency. Widely used for semiconductor chamber cleaning, descum and oxide surface treatment.

Working principle: Process gas flows into quartz tube, RF power ionizes gas to form plasma and produce reactive radicals. Radicals are delivered to vacuum chamber to perform chemical cleaning without ion bombardment. Onboard components: Quartz plasma tube, RF coupling coil, gas inlet port, temperature sensor, cooling channel, multi-pin power & communication connector

LED indicatorsPower, plasma active and fault LED indicators on RPS housing

Hardware self-diagnosis

Visual inspection, gas leak tightness test, plasma ignition test, temperature monitoring check, interlock function test

Programming software

MKS RPS configuration software for gas recipe setup, RF parameter tuning and fault log reading

Electrical & Process Parameters

RF Power: Up to 3000W RF Frequency: 13.56MHz Cooling: Water cooling Wetted material: Quartz / 316L stainless steel Applicable gas: NF3, O2 and other cleaning process gases

Mechanical & Structure

Mounting: Equipment cabinet or chamber side mounting Protection class:IP40

Environmental

Operating temperature:10℃ ~ +50℃ Ambient humidity:5~95% non-condensing Certification:CE, SEMI compliant Status:MKS AX series remote plasma source

System compatibility

Works with MKS RF generator and gas delivery MFC, supplies reactive radicals for semiconductor vacuum chamber cleaning process.

Function

AX7685-33 RPS remote plasma source manufactured by MKS Instruments. It produces reactive gas radicals for chamber dry cleaning, reduces wafer damage compared with in-situ plasma. Quartz tube erosion or gas leakage will cause plasma instability or ignition failure. It is core remote plasma component for semiconductor manufacturing.

Installation

Follow lockout/tagout safety procedure before installation. Cut off RF power and gas supply. Mount RPS unit, connect cooling water line, process gas pipeline, RF cable and control signal cable. Complete leak test and plasma ignition test before production startup.

Interface

Process gas inlet port, cooling water inlet/outlet, RF power connector, multi-pin D-sub control connector, status LED indicators on housing of AX7685-33 RPS.

Diagnostic

Plasma ignition failure: Gas flow abnormality or quartz tube contamination. Low radical efficiency: Quartz tube etching or RF power drift. Over-temperature alarm: Cooling water insufficient flow or blockage. Gas leakage: Fitting loose or seal damage.



Product Brief

AX7685-33 RPS MKS Instruments AX series remote plasma source,water cooling,13.56MHz RF plasma generation,for semiconductor vacuum chamber dry cleaning and surface treatment.


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