MKS Instruments C5002-05 RF RF Matching Network

Technical Specifications

Model：C5002-05 RF Brand：MKS Instruments Product Type: Automatic RF impedance matching network

Module Feature

MKS C5002-05 RF is automatic impedance matching network, used together with ENI ACG series RF plasma generator. It continuously adjusts internal variable capacitors to match plasma load impedance to 50Ω source impedance. Fast response for plasma impedance fluctuation, stable RF power delivery to vacuum chamber. Compact structure, low particle generation, designed for semiconductor PVD sputtering and plasma etching.

Working principle: Servo motor drives variable vacuum capacitors, automatically tunes impedance to minimize reflected power between RF generator and plasma chamber Onboard components: Servo tuning motor, vacuum variable capacitors, impedance sensor, control PCB, RF coaxial ports, multi-pin control connector

LED indicatorsPower, tune active and fault LED indicators on match box housing

Hardware self-diagnosis

Visual inspection, servo motor movement test, impedance tuning test, RF leakage test, closed-loop matching stability test

Programming software

MKS matching network configuration software for tuning speed setup, impedance offset adjustment and fault log reading

Electrical Parameters

Frequency:13.56MHz Max power rating:Matched for 1000W RF generator Control interface:0-10V analog signal + position feedback Cooling:Air cooling RF interface:50Ω coaxial port

Mechanical & Structure

Mounting:Chamber side mount Protection class:IP40

Environmental

Operating temperature:10℃ ~ +40℃ Ambient humidity:5~95% non-condensing Certification:CE, SEMI compliant Status:MKS RF matching network

System compatibility

Works with ENI ACG series RF generator, MKS Baratron pressure gauge and throttle valve, forms complete plasma process vacuum system.

Function

C5002-05 RF is automatic RF matching network manufactured by MKS Instruments. It dynamically tunes internal capacitance to reduce reflected RF power when plasma impedance changes. Improves RF power transfer efficiency and protects RF generator hardware. Capacitor contamination or servo motor failure will cause high reflected power alarm and unstable plasma. It is critical impedance matching component for semiconductor plasma process.

Installation

Follow lockout/tagout safety procedure before installation. Disconnect RF power supply. Mount matching box near vacuum chamber. Connect RF coaxial cables between generator, match box and chamber electrode. Wire control cable between RF generator and matching unit. Complete RF leakage test, auto-tune calibration and plasma recipe verification before production.

Interface

RF input / RF output coaxial ports, multi-pin electrical connector for power, analog control and position feedback, status LED indicators on housing of C5002-05 RF.

Diagnostic

High reflected power: Capacitor contamination or servo tuning motor fault. No auto-tune: Power loss or control wiring disconnection. Plasma unstable: Slow tuning speed or internal sensor drift. RF leakage: Coaxial connector loose or seal damage.

Product Brief

C5002-05 RF MKS Instruments automatic 13.56MHz RF impedance matching network,air-cooled match box,matched with ENI ACG RF generator,for semiconductor PVD sputtering and plasma etching chamber impedance tuning.